the new 2020 high purity 99 999 silicon target magnetron sputtering target rotary silicon target

  • China Sputtering Target manufacturer, Magnetron

    2021-9-30u2002·u2002China Sputtering Target supplier, Magnetron Sputtering Target, Tial Alloy Target Manufacturers Suppliers - UV Tech Material Co., Ltd. ... ACETRON 4N 99.99% High Purity ITO Rotary Target/Sputtering Target for Vacuum/PVD Coating ... Rotating Silicon Aluminum Target 2000ppm Oxygen Rotary Sial Spraying Target for Sputtering for Sale

    Get Price
  • Silicon Aluminum Rotary Sputter Target Used for

    Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, find complete details about Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, sputtering target Al Si factory, wholesale Al Si sputtering targets, china Al Si sputtering target - Baoji Oukai Sputtering Targets Technology Co.,Ltd.

    Get Price
  • igzo sputtering target, igzo sputtering target Suppliers ...

    Factory Price Buy Rotary Silicon target Si Sputtering Target Poly Crystalline Silicon Target. US $10.00-$20.00 Kilogram. ... 5N Ge Sputtering Target with the purity of 99.999%. US $1000-$2000 Piece. 1.0 Pieces ... High Purity 99.99% NbOx Sputtering target coating material rotary target. US $500.00-$1000 Unit. 1 Unit ...

    Get Price
  • China Sputtering Target, Sputtering Target Manufacturers ...

    China Sputtering Target manufacturers - Select 2021 high quality Sputtering Target products in best price from certified Chinese Epoxy Resin, China Silicon suppliers, wholesalers and factory on Made-in-China.com

    Get Price
  • Sputtering Targets and evaporation materials - Matsurf ...

    2020-6-13u2002·u2002We developed a new process to purify Zr/Hf and obtain ultra high purity Zr targets without Hf for magnetron sputtering, cathodic arc, evaporation. Hf content in The Zr is below 0.03at%. They can also be used for medical implants and surgical instruments with Hf …

    Get Price
  • Sputtering Target - Xiamen Tmax Battery Equipments

    China Sputtering Target catalog of 3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target, High Purity PVD Coating Materials 99.99% Zn Zinc Sputtering Target provided by China manufacturer - Xiamen Tmax Battery Equipments Limited, page1.

    Get Price
  • Sputtering target Manufacturers & Suppliers, China ...

    sputtering target manufacturer/supplier, China sputtering target manufacturer & factory list, find qualified Chinese sputtering target manufacturers, suppliers, factories, exporters & wholesalers quickly on Made-in-China.com.

    Get Price
  • EM-Tec high purity Disc sputtering targets and Annular ...

    EM-Tec Disc Type Sputter Targets. The EM-Tec disc type sputter targets are made using high purity metal foils and are available in 62, 60, 58, 57, 54, 50, 24 and 19mm diameter. Disc type sputter targets are widely used is all brands of sputter coaters. Most modern sputter coaters use a clamping ring to hold the target.

    Get Price
  • Rotary Sputtering Target

    Rotary Sputtering target also named by rotatable sputtering targets, or Rotating Sputtering targets, or tube sputtering targets, there are monolithic and bonding type and spray type. The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured.

    Get Price
  • China Nickel Target and Nickel Sputtering Target

    Baoji Oukai Sputtering Targets Technology Co., Ltd is a professional sputtering target manufacturer and supplier in China. We mainly supply sputtering targets used in flat panel display, coated glass industry (mainly including architectural glass, automotive glass and optical thin film glass etc.), thin film solar energy industry, surface engineering (decoration & tools), …

    Get Price
  • Cr Target Factory, Custom Cr Target OEM/ODM

    ACETRON 99.5% High Purity Cr Rotary Sputtering Target for PVD Coating. Unit Price: US $ 99-99999 Piece ... 99.999% Pure Silicon Cylinder Granules Si Pellet. ... High Pure 99.95% Chrome/Chromium/Cr PVD Magnetron Sputtering Target for Vacuum Coating.

    Get Price
  • Sputtering Target - Xiamen Tmax Battery Equipments

    China Sputtering Target catalog of 3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target, High Purity PVD Coating Materials 99.99% Zn Zinc Sputtering Target provided by China manufacturer - Xiamen Tmax Battery Equipments Limited, page1.

    Get Price
  • Influences of different sputtering current on the ...

    Two identical silicon targets (300 mm × 75 mm × 4 mm) of 99.99% purity were used as the sputtering sources. 99.999% purity nitrogen and argon were introduced into the chamber as the working gases. A heating and measuring system in the vacuum chamber was employed to adjust the deposition temperature.

    Get Price
  • Sputtering Targets and evaporation materials - Matsurf ...

    2020-6-13u2002·u2002We developed a new process to purify Zr/Hf and obtain ultra high purity Zr targets without Hf for magnetron sputtering, cathodic arc, evaporation. Hf content in The Zr is below 0.03at%. They can also be used for medical implants and surgical instruments with Hf …

    Get Price
  • The effect of substrate bias on the piezoelectric ...

    2020-12-15u2002·u2002ited onto Ni substrates by reactive sputtering with constant parameters except for deposition time and substrate bias voltage. The sputtering cathode was thick pure Al target (99.999%) and was continuously water cooled. The gases used are high-purity argon (99.999%) as the working gas and nitrogen (99.999%) as reactive gas.

    Get Price
  • Preparation of Cu3SnS4 film with single ceramic target ...

    2021-6-24u2002·u2002A ternary stoichiometric Cu 3 SnS 4 ceramic target with 99.99% purity was used for the sputtering. The base pressure for sputtering deposition was 3 × 10 –4 Pa. With high purity argon (99.999%) as the working gas, the argon gas flow rate was 30 ssm and working pressure was maintained at 0.5 Pa.

    Get Price
  • Effect of sputtering pressure on the structure and ...

    2020-10-1u2002·u2002The effects of sputtering pressure on the O/Si ratio, microstructure, surface morphology and optical properties within 300–1100 nm of SiO 2 film via radio frequency magnetron sputtering were investigated. The results showed that the molar ratio of O/Si in the film increased from 1.96 to 2.03, from silicon rich to oxygen rich, with the sputtering pressure …

    Get Price
  • EM-Tec high purity Disc sputtering targets and Annular ...

    EM-Tec Disc Type Sputter Targets. The EM-Tec disc type sputter targets are made using high purity metal foils and are available in 62, 60, 58, 57, 54, 50, 24 and 19mm diameter. Disc type sputter targets are widely used is all brands of sputter coaters. Most modern sputter coaters use a clamping ring to hold the target.

    Get Price
  • Zinc Sputtering Target,Zinc Alloy Target - Buy zinc ...

    Zinc Sputtering Targets, Zinc alloy Target Baoji Okai Sputtering Targets Technology Co., Ltd is a professional sputtering target manufacturer and supplier in China. We mainly supply sputtering targets used in flat panel display, coated glass industry (mainly including architectural glass, automotive glass and optical thin film glass etc.), thin ...

    Get Price
  • High mobility Si0.15Ge0.85 growth by using the molten ...

    2019-8-9u2002·u2002The benefits of hot target sputtering from an evaporation factor in productivity and film quality were reported from 2009 16,17,18.The idea was extended to the High Power Impulse Magnetron …

    Get Price
  • China Sputtering Target manufacturer, Magnetron

    2021-9-30u2002·u2002China Sputtering Target supplier, Magnetron Sputtering Target, Tial Alloy Target Manufacturers Suppliers - UV Tech Material Co., Ltd. ... ACETRON 4N 99.99% High Purity ITO Rotary Target/Sputtering Target for Vacuum/PVD Coating ... Rotating Silicon Aluminum Target 2000ppm Oxygen Rotary Sial Spraying Target for Sputtering for Sale

    Get Price
  • Silicon Aluminum Rotary Sputter Target Used for

    Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, find complete details about Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, sputtering target Al Si factory, wholesale Al Si sputtering targets, china Al Si sputtering target - Baoji Oukai Sputtering Targets Technology Co.,Ltd.

    Get Price
  • igzo sputtering target, igzo sputtering target Suppliers ...

    Factory Price Buy Rotary Silicon target Si Sputtering Target Poly Crystalline Silicon Target. US $10.00-$20.00 Kilogram. ... 5N Ge Sputtering Target with the purity of 99.999%. US $1000-$2000 Piece. 1.0 Pieces ... High Purity 99.99% NbOx Sputtering target coating material rotary target…

    Get Price
  • China Sputtering Target, Sputtering Target Manufacturers ...

    China Sputtering Target manufacturers - Select 2021 high quality Sputtering Target products in best price from certified Chinese Epoxy Resin, China Silicon suppliers, …

    Get Price
  • Sputtering Targets and evaporation materials - Matsurf ...

    2020-6-13u2002·u2002We developed a new process to purify Zr/Hf and obtain ultra high purity Zr targets without Hf for magnetron sputtering, cathodic arc, evaporation. Hf content in The Zr is below 0.03at%. They can also be used for medical implants and surgical instruments with Hf content <0.03%.

    Get Price
  • Sputtering Target - Xiamen Tmax Battery Equipments

    China Sputtering Target catalog of 3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target, High Purity PVD Coating Materials 99.99% Zn Zinc Sputtering Target provided by China manufacturer - Xiamen Tmax Battery Equipments Limited, page1.

    Get Price
  • Sputtering target Manufacturers & Suppliers, China ...

    sputtering target manufacturer/supplier, China sputtering target manufacturer & factory list, find qualified Chinese sputtering target manufacturers, suppliers, factories, …

    Get Price
  • EM-Tec high purity Disc sputtering targets and Annular ...

    EM-Tec Disc Type Sputter Targets. The EM-Tec disc type sputter targets are made using high purity metal foils and are available in 62, 60, 58, 57, 54, 50, 24 and 19mm diameter. Disc type sputter targets are widely used is all brands of sputter coaters. Most modern sputter coaters use a clamping ring to hold the target.

    Get Price
  • Rotary Sputtering Target

    Rotary Sputtering target also named by rotatable sputtering targets, or Rotating Sputtering targets, or tube sputtering targets, there are monolithic and bonding type and spray type. The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured.

    Get Price
  • China Nickel Target and Nickel Sputtering Target

    Baoji Oukai Sputtering Targets Technology Co., Ltd is a professional sputtering target manufacturer and supplier in China. We mainly supply sputtering targets used in flat panel display, coated glass industry (mainly including architectural glass, automotive glass and optical thin film glass etc.), thin film solar energy industry, surface engineering (decoration & tools), electric resistance ...

    Get Price
  • China Sputtering Target manufacturer, Magnetron

    2021-9-30u2002·u2002China Sputtering Target supplier, Magnetron Sputtering Target, Tial Alloy Target Manufacturers Suppliers - UV Tech Material Co., Ltd. ... ACETRON 4N 99.99% High Purity ITO Rotary Target/Sputtering Target for Vacuum/PVD Coating ... Rotating Silicon Aluminum Target 2000ppm Oxygen Rotary Sial Spraying Target for Sputtering for Sale

    Get Price
  • Silicon Aluminum Rotary Sputter Target Used for

    Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, find complete details about Silicon Aluminum Rotary Sputter Target Used for Magnetron Sputtering, sputtering target Al Si factory, wholesale Al Si sputtering targets, china Al Si sputtering target - Baoji Oukai Sputtering Targets Technology Co.,Ltd.

    Get Price
  • igzo sputtering target, igzo sputtering target Suppliers ...

    Factory Price Buy Rotary Silicon target Si Sputtering Target Poly Crystalline Silicon Target. US $10.00-$20.00 Kilogram. ... 5N Ge Sputtering Target with the purity of 99.999%. US $1000-$2000 Piece. 1.0 Pieces ... High Purity 99.99% NbOx Sputtering target coating …

    Get Price
  • China Sputtering Target, Sputtering Target Manufacturers ...

    China Sputtering Target manufacturers - Select 2021 high quality Sputtering Target products in best price from certified Chinese Epoxy Resin, China Silicon suppliers, …

    Get Price
  • Sputtering Targets and evaporation materials - Matsurf ...

    2020-6-13u2002·u2002We developed a new process to purify Zr/Hf and obtain ultra high purity Zr targets without Hf for magnetron sputtering, cathodic arc, evaporation. Hf content in The Zr is below 0.03at%. They can also be used for medical implants and surgical instruments with Hf content <0.03%.

    Get Price
  • Sputtering Target - Xiamen Tmax Battery Equipments

    China Sputtering Target catalog of 3n/4n/4n5 PVD Coating Mterials Wti Tungsten Titanium Alloy Sputtering Target, High Purity PVD Coating Materials 99.99% Zn Zinc Sputtering Target provided by China manufacturer - Xiamen Tmax Battery Equipments Limited, page1.

    Get Price
  • Sputtering target Manufacturers & Suppliers, China ...

    sputtering target manufacturer/supplier, China sputtering target manufacturer & factory list, find qualified Chinese sputtering target manufacturers, suppliers, factories, …

    Get Price
  • EM-Tec high purity Disc sputtering targets and Annular ...

    EM-Tec Disc Type Sputter Targets. The EM-Tec disc type sputter targets are made using high purity metal foils and are available in 62, 60, 58, 57, 54, 50, 24 and 19mm diameter. Disc type sputter targets are widely used is all brands of sputter coaters. Most modern sputter coaters use a …

    Get Price
  • Rotary Sputtering Target

    Rotary Sputtering target also named by rotatable sputtering targets, or Rotating Sputtering targets, or tube sputtering targets, there are monolithic and bonding type and spray type. The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured.

    Get Price
  • China Nickel Target and Nickel Sputtering Target

    Baoji Oukai Sputtering Targets Technology Co., Ltd is a professional sputtering target manufacturer and supplier in China. We mainly supply sputtering targets used in flat panel display, coated glass industry (mainly including architectural glass, automotive glass and optical thin film glass etc.), thin film solar energy industry, surface engineering (decoration & tools), electric resistance ...

    Get Price
  • Titanium Silicon Sputtering Target

    2021-10-9u2002·u2002American Elements specializes in producing high purity Titanium Silicon Sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock …

    Get Price
  • Coatings

    For the Si doping, a single 99.999% pure silicon target (Kurt J. Lesker, Hastings, UK) was used, with dimensions 300 mm × 100 mm × 0.635 mm. Figure A2 demonstrates the target composition via XRD analysis to be mostly HA.

    Get Price
  • Tungsten Silicon Sputtering Target

    2021-10-9u2002·u2002American Elements specializes in producing high purity Tungsten Silicon Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock …

    Get Price
  • Chemical Engineering Journal

    2020-12-9u2002·u20023 nanolaminates were deposited on a silicon substrate by magnetron sputtering, as shown in Fig. 1a. The Al target disk 3 target disk (Φ76 mm×5mm, purity > 99.999%) were purchased from Zhongnuo Xincai Technology Corporation and used for depositing Al and MoO 3 films. The pressure in the vacuum chamber was pumped away below 9×10−4 Pa before ...

    Get Price
  • Study of the deposition of Ti/TiN multilayers by

    purity Ti (99.999%) target onto Si(100) surfaces. ... gases used are high-purity argon (99.99990%) as the working gas ... Deposition of Titanium Nitride Thin Films onto Silicon by RF Reactive ...

    Get Price
  • Electrochemical behavior of superhard nanocomposite ...

    2013-6-15u2002·u2002The use of these guns allowed independent sputtering of the two materials. High purity titanium (99.95%) and silicon (99.999%) targets were used for the deposition of the nanocomposite coatings, wherein a DC power supply was used to sputter the titanium target and an asymmetric bipolar-pulsed DC power supply (frequency = 100 kHz, pulse width ...

    Get Price
  • Highly sensitive two-dimensional MoS2 gas sensor

    2018-12-12u2002·u2002The MoS 2 film was grown by a showerhead-type reactor using Mo(CO) 6 (better than 99.9% purity, Sigma-Aldrich), high-purity H 2 (99.999%), Ar (99.999%) and H 2 S (99.9%) with an operating temperature of 400°C. A p-type silicon wafer (1–10 Ω cm) with 300 nm silicon dioxide was used as the substrate for growth.

    Get Price
  • Spark plasma sintering of Sb2Se3 sputtering target

    2020-7-1u2002·u2002An effective method of ball milling combined with SPS process using 30 g of high purity Sb 2 Se 3 particles (99.99%, Advanced Material Professional Manufacture, 100 meshes) as raw materials was used to prepare Sb 2 Se 3 target. A schematic illustration of the preparation process is shown in Fig. 1.The ball milling was performed at room temperature in a vertical …

    Get Price
  • China Sputtering Targets, High Purity Metals, Evaporation ...

    Loyaltarget is a leading manufacturer of high purity metal materials and PVD thin film materials in China with more than 10 years experience. Our company specializes in thin film coating materials, including high purity metals, sputtering targets and evaporation materials.

    Get Price
  • Effect of sputtering power on the properties of SiO2 films ...

    2021-1-1u2002·u2002SiO2 thin films were prepared with radio frequency magnetron sputtering on quartz glass substrates, and the effects of sputtering power on the stoichiometric ratio, microstructure, surface morphology and optical properties of the film within 300–1100 nm were investigated. The molar ratio of O/Si in the film increased continuously from 1.87 to 1.99, very close to the ideal …

    Get Price
  • Structure and photocatalytic properties of TiO2/Cu3N ...

    2021-3-1u2002·u2002The JGP-450a type magnetron sputtering deposition system used a high-purity copper target (99.999 %), a TiO 2 target (99.99 %), cross-sputtering method, and Ar and N 2 as the working gases. The single crystal silicon (100) and quartz piece are used as the substrate.

    Get Price
  • Influences of different sputtering current on the ...

    Two identical silicon targets (300 mm × 75 mm × 4 mm) of 99.99% purity were used as the sputtering sources. 99.999% purity nitrogen and argon were introduced into the chamber as the working gases. A heating and measuring system in the vacuum chamber was …

    Get Price
  • Titanium Silicon Sputtering Target

    2021-10-9u2002·u2002American Elements specializes in producing high purity Titanium Silicon Sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target ...

    Get Price
  • Adhesion Strength Prediction of CrAlN Coating on Al–Si ...

    2021-3-28u2002·u2002CrAlN coating was synthesized on LM28 substrates using a multi-target DC power and RF power magnetron sputtering system shown in Fig. 1. Two circular high purity aluminum (99.999%) and chromium (99.999%) targets were sputtered in high purity nitrogen (99.99%) and argon (99.99%) plasma.

    Get Price
  • Electrochemical behavior of superhard nanocomposite ...

    2013-6-15u2002·u2002The use of these guns allowed independent sputtering of the two materials. High purity titanium (99.95%) and silicon (99.999%) targets were used for the deposition of the nanocomposite coatings, wherein a DC power supply was used to sputter the titanium target and an asymmetric bipolar-pulsed DC power supply (frequency = 100 kHz, pulse width ...

    Get Price
  • Nickel Chromium Silicon Sputtering Target

    2021-8-25u2002·u2002American Elements specializes in producing high purity Nickel Chromium Silicon Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with …

    Get Price
  • Tungsten Silicon Sputtering Target

    2021-10-9u2002·u2002American Elements specializes in producing high purity Tungsten Silicon Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target ...

    Get Price
  • Spark plasma sintering of Sb2Se3 sputtering target

    2020-7-1u2002·u2002An effective method of ball milling combined with SPS process using 30 g of high purity Sb 2 Se 3 particles (99.99%, Advanced Material Professional Manufacture, 100 meshes) as raw materials was used to prepare Sb 2 Se 3 target. A schematic illustration of the preparation process is shown in Fig. 1.The ball milling was performed at room temperature in a vertical planetary ball mill using ...

    Get Price
  • EM-Tec high purity Disc sputtering targets and Annular ...

    EM-Tec Disc Type Sputter Targets. The EM-Tec disc type sputter targets are made using high purity metal foils and are available in 62, 60, 58, 57, 54, 50, 24 and 19mm diameter. Disc type sputter targets are widely used is all brands of sputter coaters. Most modern sputter coaters use a clamping ring to hold the target.

    Get Price
  • Coatings

    In recent years, it has been found that small weight percent additions of silicon to HA can be used to enhance the initial response between bone tissue and HA. A large amount of research has been concerned with bulk materials, however, only recently has the attention moved to the use of these doped materials as coatings. This paper focusses on the development of a co-RF and pulsed DC magnetron ...

    Get Price