12 15 20 25 30mmr50 t50 beamsplitter prisms 400-700nm vis wavelength

  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 ...

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  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850- …

    Get Price
  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 …

    Get Price
  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium.

    Get Price
  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 ...

    Get Price
  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850- …

    Get Price
  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 …

    Get Price
  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium.

    Get Price
  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 …

    Get Price
  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium.

    Get Price
  • Softel Mini Optical Node FTTH CATV Optical Receiver

    12 15 20 25 30mmR50 T50 Beamsplitter Prisms for 400-700nm VIS wavelength; optical silicon window silicon wafer IR illuminator Si wafer lens thermal silicon wafer plate with AR coating NIR application; 1 499 Cr39 resin wholesale sunglass sun lenses 7 Green Mirror color

    Get Price
  • Mississippi

    12.6 14 8200052830 30. 49057 15.3 17 8200052830 30. 49057 115.2 128 8200052830 30. 49057 148.5 165 8200052830 30. 49057 410.40000000000003 456 8200052830 30. 49057 476.1 529 8200052830 30. 49057 5599.8 6222 ... 400 8200052830 35. 49057 555.30000000000007 617 8200052830 35. 49057 3150 3500 8200052830 35. 49057 3150 3500 8200052830 35. 49057 …

    Get Price
  • euv lithography reflector: Topics by Science.gov

    1990-12-25. Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium.

    Get Price